- Design and implement algorithmic solutions within the mask data preparation and lithography systems modeling domains.
- Contribute to the continuous enhancement of Siemens EDAs product lines through design reviews and technical innovations.
- Collaborate effectively with multi-functional teams across different geographies and cultures.
- Engage with co-workers and collaborators to improve product quality and drive technical excellence.
- Provide technical consultation and drive improvements in product functionality.
Skills Required
- Strong programming skills in C/C++ with deep expertise in object-oriented design.
- Solid understanding of algorithms and data structures, with a strong theoretical background in algorithm analysis.
- Experience with geometric data processing and computational geometry algorithms.
- Proficiency in distributed computing environments.
- Familiarity with modern software development methodologies such as Agile.
Desirable Technical Skills
- Experience in developing EDA applications in the post-layout domain (e.g., Mask Data Preparation, Modeling).
- Knowledge of model calibration tools or an understanding of the model calibration process in semiconductor manufacturing.
- A solid base in computational mathematics and numerical methods (including non-linear optimization).
- Experience in handling large layout/mask data in formats like OASIS, GDSII, MEBES, VSB.
- Familiarity with parallel and distributed computing tools (e.g., Sun Grid Engine, LSF).
- Experience with configuration management tools such as CVS.
- Knowledge of Scrum methodologies and defect tracking tools like JIRA.
