semiconductor process , Optical Proximity Correction (OPC), Statistical Analysis, Anova, Data Analytics, Lithography process, Computational OPC solutions, design of experiments, Jmp, OPC modelling and rule setting, Flare, Diffraction, Refraction, Lithography process tools, Design enablement and tape-out systems, Patterning aspects, CAD layout, Reticle Enhancement structures

Opc, orc, EDA Tools